Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


한국표면공학회지 (35권2호 107-112)

A Study on Diffusion Behavior in NiFe/Ag Bilayer Films deposited by ion Beam Sputtering Methods

이온빔 스퍼터링 방법으로 증착한 NiFe/Ag 박막의 확산 거동


고려대학교 재료공학부;한국표준과학연구원;
고려대학교 재료공학부;한국표준과학연구원;


We have studied diffusion behavior of NiFe/Ag bilayer deposited by on silicon Ion Beam Sputtering methods. The diffusion behavior of NiFe and Ag in NiFe/Ag thin film is analyzed by Medium Energy Ion Scattering Spectroscopy. For samples without Ta underlayer, silicides such as Ni-Si or Fe-Si were formed at Si substrate and NiFe interface. In contrast, Ag predominantly diffused into the NiFe layer probably through their grain boundaries for Ta underlayered samples.