Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (32권4호 538-546)

Photoelectrochemical Property of Ti(IV)-Fe(III) Oxide Films Deposited by MOCVD

MOCVD법에 의한 Ti(IV)-Fe(III) 산화물 박막의 광전기화학적 특성

김현수;윤재홍;
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동북공업기술연구소 환경재료연구실;창원대학교 공과대학 금속재료공학과;
동북공업기술연구소 환경재료연구실;창원대학교 공과대학 금속재료공학과;

Abstract

Ti(IV)-Fe(III) oxide films were formed by MOCVD technique, and their photoelectrochemical properties were examined in 0.5M N $a_2$$SO_4$ solution by a photoelectrochemical polarization test. Ti(IV)-Fe(III) oxide films deposited at 40$0^{circ}C$ by MOCVD have crystalline structure and are all n-type semiconductors. The photocurrent and the quantum efficiency of the films increase with increasing the iron cationic fraction ($X_{Fe}$ ) in the films. The energy band gap of the films increase linearly with increasing the iron cationic fraction in the films. Ti(IV)-Fe(III) oxide film of $X_{Fe}$ /=0.60 has high photocurrent response and corrosion resistance simultaneously.

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