Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (5권2호 1-4)

ABS 수지상의 화학도금에서의 최적 Eteching 조건에 관한 연구

ABS 수지상의 화학도금에서의 최적 Eteching 조건에 관한 연구

김원택;이인배;
;;

한양대학교 공과대학;한양대학교 공과대학 조교;
한양대학교 공과대학;한양대학교 공과대학 조교;

Abstract

We have studied about the optimum chemical etching and sensitizing conditions of the plating on plastics. As specimen `Mitzubishi Nobren MM2A` was used. The results were as follow. 1) The optimum chemical etching conditions. Etched the specimens for $10{sim}40$ minutes at $70{sim}80^{circ}C$ with the etching solution of table 1, and for $10{sim}15$ minutes at $65{sim}70^{circ}C$ with the etching solution of table 2 Table 1. Etching solution (I) Composition : $H_2SO_4(95%)-Component : 250 ml, Composition : $H_3PO_4(85%)$ - Component : 75ml, Composition : $K_2Cr_2O_7$ - Component : 12.5g, 2) The optimum sensitizing conditions. Sensitized the specimens for $60{sim}90$ seconds at $25^{circ}C$ with the sensitizing solution of table 3 Table 2. Etching solution (II) Composition : $H_2SO_4(95%)$ - Component : 22.5ml, Composition : $H_3PO_4(85%)$ - Component : 15ml, Composition : $CrO_3$ - Component : 105g, Composition : Water - Component : 150 ml, Table 3. Sensitizing solution Composition : $SnCl_2$ - Component : 9g, Composition : HCl(35%) - Component : 36ml, Composition : Water - Component : 300 ml

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