한국표면공학회지 (55권2호 77-83)
Relationship between inductively coupled plasma and crystal structure, mechanical and electrical properties of MoN coatings
유도결합 플라즈마 파워에 따른 MoN 코팅막의 결정구조 및 기계·전기적 특성 변화
Hoon Jang and Sung-Yong Chun*
Department of Advanced Materials Science and Engineering, Mokpo National University, Jeonnam 58554, Korea
Nanocrystalline MoN coatings were prepared by inductively coupled plasma magnetron sputtering (ICPMS) changing the plasma power from 0 W to 200 W. The properties of the coatings were analyzed by x-ray diffraction, field emission scanning electron microscopy, atomic force microscopy, nanoindentation tester and semiconductor characterization system. As the ICP power increases, the crystal structure of the MoN coatings changed from a mixed phase of Υ-Mo2N and α-Mo to a single phase Υ-Mo2N. MoN coatings deposited by ICPMS at 200 W showed the most compact microstructure with the highest nanoindentation hardness of 27.1 GPa. The electrical resistivity of the coatings decreased from 691.6 μΩ cm to 325.9 μΩ cm as the ICP power increased.
Inductively coupled plasma; Υ-Mo2N; Crystal structure; Roughness; Electrical resistivity