한국표면공학회지 (55권2호 70-76)
A comparative study of electrochemical properties in CrN films prepared by inductively coupled plasma magnetron sputtering
유도결합형 플라즈마 마그네트론 스피터로 제작된 CrN 코팅막의 전기화학적 물성 비교 연구
Hoon Jang and Sung-Yong Chun*
Department of Advanced Materials Science and Engineering, Mokpo National University, Jeonnam 58554, Korea
DOI : 10.5695/JSSE.2022.55.70
In this paper, we compared the properties of the chromium nitride (CrN) films prepared by inductively coupled plasma magnetron sputtering (ICPMS). As a comparison, CrN film prepared by a direct current magnetron sputtering (dcMS) is also studied. The crystal structure, surface and cross-sectional microstructure and composite properties of the as-deposited CrN films are compared by x-ray diffraction, field emission scanning electron microscopy, nanoindentation tester and corrosion resistance tester, respectively. It is found that the as-deposited CrN films by ICPMS grew preferentially on (200) plane when compared with that by dcMS on (111) plane. As a result, the films deposited by ICPMS have a very compact microstructure with high hardness: the nanoindentation hardness reached 19.8 GPa and 13.5 GPa by dcMS, respectively. Besides, the residual stress of CrN films prepared by ICPMS is also relatively large. After measuring the corrosion resistance, the corrosion current of films prepared by ICPMS was three order of magnitude smaller than that of CrN films deposited by dcMS.
Inductively coupled plasma; Corrosion resistance; Chromium Nitride