Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (33권4호 273-280)

A Study on he Electroless Deposits and Electrodeposits

무전해 은도금층과 전기도금층의 형성에 관한 연구

임종주;민병승;정원섭;김인곤;;
;;;;Gerard P. Martins;

부산대학교 금속공학과;동의대학교 신소재공학과;마인즈대학교 금속재료공학과;
부산대학교 금속공학과;동의대학교 신소재공학과;마인즈대학교 금속재료공학과;

Abstract

Silver was deposited on glass by electroless plating and electroplating. Surface properties were investigated using the AFM. Crystal structure of deposit layers was confirmed by TEM and XRD. Electroplating is performed by DC plating and pulse plating, respectively. This study resulted in followings, first, deposit of electroless plating showed fine grain and was similar to the amorphous structure. Second, electrodeposit on the electroless layer was revealed following results ; (1) more uniform layer and finer grains were obtained with increasing frequency (2) more isotropic structure was obtained with increasing frequency (3) finer grains at 25% duty cycle was obtained (4) grain size and roughness of the silver deposit was decreased with increasing frequency.

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