Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


한국표면공학회지 (28권2호 101-109)

Etching behavior of electroetching by using photomask

Photomask를 이용한 electroetching의 부식거동


충남대학교 공과대학 금속공학과;
충남대학교 공과대학 금속공학과;


Electroetching rates of $FeCl_3$ solution were increased according to increasing solution temperature. Activation energy of electroetching at Be`36 and 5A/$dm^2$ condition was 28.3Kcal and also, at Be`46 and 5A/dm$^2$ condition was 33.2Kcal. At Be`36 concentration of $FeCl_3$ solution, electroetching rate were more higher than at Be`46 concentration. Surfaces of etched grooves obtained at 8A/$dm^2$ or higher current density in 46 Be` concentration of $FeCl_3$ solution were observed to be flat and smooth owing to suppressing chemical etching reaction. Distinctly etched boundaries became to be appeared at 2A/$dm^2$ in Be`41 electroetching condition by differential effects. In case of applying 8A/$dm^2$ current density to Be`46 of $FeCl_3$ solution, etching depth were 4 times and side etching were 6 times more than chemical etching case respectively.