Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


한국표면공학회지 (23권4호 208-217)

Plating Rate of Electroless Nikel-Copper-Phosphorus Plating and Change in Microhardness and Corrosion Rate depending on. Heat treatment

무전해 니켈-구리-인 도금의 도금속도와 열처리에 따른 경도 및 내삭성 변화


부산공업대학 금속공학과;동아대학교 공과대학 금속공학과;
부산공업대학 금속공학과;동아대학교 공과대학 금속공학과;


Electroless Ni-Cu-P plating was performed was performed to investigate for plating and changes in microhardness and corrosion rate of of electroless deposits depending on heat treatment. The activation energy for $75~85^{circ}C$ were calculated to be 66.7KJ/mole. Plating rate increased to 34% with addition of 200ppm of NaF and 0.8ppm of thiourea to the bath. The highest hardness value was obtained by heat treatment deposits layer at$ 400^{circ}C$, 1 hour. The increase in hardness of deposits by heating was confirmed to be associated with crystallization of the amorphous deposits. Corrosion resistance of deposir layer, which had been heated up to $300^{circ}C$, was found to be exellent when immersed in 1N-H2SO4 solution, Change of the corrosion resistance seems to have some important bearing on content of amorpous, Ni3P and Cu3P.