Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


한국표면공학회지 (43권6호 309-314)

A Study on the Heat Transfer Characteristics of the Large Dimension Heater Plate for a Semiconductor Process

반도체 표면처리공정용 대면적 히터 플레이트의 열전달 특성에 관한 연구

Lee, Yun-Yong;Kang, Hwan-Kook;Moon, Seok-Hwan;

대림대학 기계과;동은에이티에스;한국전자통신연구원;
Mechanical Engineering, Daelim College University;Dongeun A.T.S.;ETRI;

DOI : 10.5695/JKISE.2010.43.6.309


The numerical study for the effect of various factors that affect the temperature distribution of the process glass installed above the large rectangular heater plate was carried out. For the calculation, heat flux, distance between heat source and process glass plate, effect of vacuum condition and convection in a chamber were considered as important factors. The results showed that the temperature gradient on the glass was increased at the natural convection because of the buoyancy force increases due to the heated air. Also, the more heat flux and distance between the heater plate and glass increases, the more increasing the temperature gradient was. In the case of isothermal heating wall, the temperature variation was smaller than the uniform heat flux condition.


Heater plate;Process glass;Heat flux;Isothermal heating wall;