한국표면공학회지 (43권2호 91-96)
Ion Nitriding Using Pulsed D.C Glow Discharge Combined with Inductively Coupled Plasma
펄스직류방전과 유도결합방전의 복합에 의한 SCM440강의 이온질화
한밭대학교 공과대학 신소재공학부;
Department of Welding and Production Engineering, Hanbat National University;
SCM440 steels were nitrided using pulsed dc plasma combined with inductively coupled plasma (ICP) generated by 13.56 MHz rf power in order to enhance case hardening depth. The case hardening depth was increased with rf power. The effective case-depth with ICP at 900 watt was as 1.6 times as that nitrided without ICP. The hardening depth was also increased up to 1.45 times. The compound layers formed on top surface were dense and thin when pulsed dc plasma was combined with ICP.
Ion nitriding;Deep case hardening;ICP;Pulsed dc plasma;Nitrogen diffusion;