Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

Atmospheric Pressure Plasma Research Activity in Korea

;
[Uhm, Han S.;]

Department of Molecular Science & Technology, Ajou University;

한국표면공학회지, Vol. 34, No. 5, pp. 367-377.

DOI :

Perspective of industrial application of high pressure and low temperature plasma

;;
[Kogoma, Masuhiro;Tanaka, Kunihito;]

Faculty of Science and Technology, Department of Chemistry;

한국표면공학회지, Vol. 34, No. 5, pp. 378-383.

DOI :

Atmospheric Pressure Micro Plasma Sources

;
[Brown, Ian;]

Lawrence Berkeley National Laboratory Berkeley;

한국표면공학회지, Vol. 34, No. 5, pp. 384-390.

DOI :

The atmospheric plasma reactor with water wall to decompose CF4

;;;;
[Itatani, Ryohei;Deguchi, Mikio;Toda, Toshihiko;Ban, Heitaro;]

Niihama National College of Technology;Youth Engineering Co., LTD.;

한국표면공학회지, Vol. 34, No. 5, pp. 391-394.

DOI :

Recent Advance in High Pressure Induction Plasma Source

;
[Sakuta, T.;]

Department of Electrical and Computer Engineering Kanazawa University;

한국표면공학회지, Vol. 34, No. 5, pp. 395-402.

DOI :

Global Warming Gas Emission during Plasma Cleaning Process of Silicon Nitride Using C-C$_4$F$_8$O Feed Gas with Additive $N_2$

;;;;;;;
[Kim, K.J.;C.H. Oh;Lee, N.E.;Kim, J.H.;J.W. Bae;G.Y. Yeom;S.S. Yoon;]

Dept. of Materials Engineering, Sungkyunkwan University;Dept. of Materials Engineering and Center for Advanced Plasma Surface Technology, Sungkyunkwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 403-408.

DOI :

High rate magnetron sputtering of thick Cr-based tribological coatings

;;;;
[Bin, Jin H.;Nam, Kyung H.;Boo, Jin H.;Han, Jeon G.;]

Center for Advanced Plasma Surface Technology, SungKyunKwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 409-413.

DOI :

Hard TiN Coating by Magnetron-ICP P $I^3$D

;;;;;
[S.A. Nikiforov;Kim, G.H.;G.H. Rim;K.W. Urm;Lee, S.H.;]

Korea Electrotechnology Research Institute (KERI);Doosan Heavy Industries & Construction Co.;

한국표면공학회지, Vol. 34, No. 5, pp. 414-420.

DOI :

Synthesis of WC-CrN superlattice film by cathodic arc ion plating system

;;;
[Lee, Ho.Y.;Jeon.G. Han;Se.H. Yang;]

Center for Advanced Plasma Surface Technology SungKyunKwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 421-428.

DOI :

The effect of metal composition on the structure and properties of Ti-Cu-N superhard nanocomposite coatings

;;;
[Hyun S. Myung;Lee, Hyuk M.;Jeon G. Han;]

Center for Advanced Plasma Surface Technology(CAPST), Sungkyunkwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 429-434.

DOI :

The electrochemical properties of PVD-grown WC-( $Ti_{1-x}$A $I_{x}$)N multiplayer films in a 3.5% NaCl solution

;;;;;
[S.H. Ahn;J.H. Yoo;Kim, J.G.;Lee, H.Y.;J.G. Han;]

Center for Advanced Plasma Surface Technology(CAPST), SungKyunKwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 435-444.

DOI :

Characterization of oxide scales formed on TiCrN coatings

;;
[Kim, Gi-Young;Lee, Dong-Bok;]

Center for Advanced Plasma Surface Technology, Sungkyunkwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 445-447.

DOI :

Novel room temperature grown carbon based cathodes for field emission using diamond nano-particle seeding technique

;;
[Satyanarayana, B.S.;Hiraki, A.;]

KUT Academic & Industrial Collaboration Centre, Kochi University of Technology;

한국표면공학회지, Vol. 34, No. 5, pp. 448-454.

DOI :

Role of Energy and Composition of Film-Forming Species in Formation of Composition and Structure of Compound Films

;
[Shaginyan, L.R.;]

Institute for Materials Science Problems of National Academy of Sciences of Ukraine;

한국표면공학회지, Vol. 34, No. 5, pp. 455-464.

DOI :

An optimized condition for corrosion protection of Type 304 Films prepared by unbalanced magnetron sputtering in 3.5% NaCl solution

;;;;
[Yoo, Ji-Hong;Ahn, Seung-Ho;Kim, Jung-Gu;Lee, Sang-Yul;]

Department of Advanced Materials Engineering, Sungkyunkwan University;Department of Materials Engineering, Hankuk Aviation University;

한국표면공학회지, Vol. 34, No. 5, pp. 465-474.

DOI :

Comparative Measurements and Characteristics of Cu Diffusion into Low-Dielectric Constant para-xylene based Plasma Polymer Thin Films

;;;;;;
[Kim, K.J.;Kim, K.S.;Y.C. Jang;Lee, N.E.;Park, J.;D. Jung;]

Department of Materials Engineering and Center for Advanced Plasma Surface Technology Sungkyunkwan University;Department of Physics, Sungkyunkwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 475-480.

DOI :

Preparation and Characterization of Barium Zirconate Titanate Thin Films

;;;;;
[Park, Won-Seok;Jang, Bum-Sik;Yonghan Roh;Junsin Yi;Byungyou Hong;]

Electrical and Computer Engineering, Sungkyunkwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 481-485.

DOI :

Heat Treatment Effects on the Phase Evolutions of Partially Stabilized Grade Zirconia Plasma Sprayed Coatings

;;;
[Park, Han-Shin;Kim, Hyung-Jun;Lee, Chang-Hee;]

Division of Material Science and Engineering, Hanyang University;RIST, Welding & Structural Integrity Research Team;

한국표면공학회지, Vol. 34, No. 5, pp. 486-493.

DOI :

Tunnel i unction-Mangnetorsistance in Co-Al-O$_{x}$-NiFe with oxidation conditions of Al thickness

;;;
[Jeon, Dong-Min;Park, Jin-Woo;Suh, Su-Jeong;]

Depart. of Advanced Materials. Engin., Sungkyunkwan Univ.;

한국표면공학회지, Vol. 34, No. 5, pp. 494-498.

DOI :

The Oxidation of Functionally Gradient NiCrAlY/YSZ Coatings

;;;;
[Park, K.B.;Park, H.S.;Kim, H.J.;Lee, D.B.;]

Center for Advanced Plasma Surface Technology, Sungkyunkwan University;Division of Materials Science and Engineering, Hanyang University;Center for Advanced Plasma Surface Technology, RIST;

한국표면공학회지, Vol. 34, No. 5, pp. 499-502.

DOI :

Growth and Characterization of a-Si :H and a-SiC:H Thin Films Grown by RF-PECVD

;;;;;;;;;
[Kim, Y.T.;S.J. Suh;D.H. Yoon;Park, M.G.;Park, W.S.;Kim, M.C.;J.H. Boo;B. Hong;G.E. Jang;]

School of Metallurgical & Materials Engineering, Sungkyunkwan University;Center for Advanced Plasma Surface Technology, Sungkyunkwan University;Department of Materials Science & Engineering, Chungbuk University;

한국표면공학회지, Vol. 34, No. 5, pp. 503-509.

DOI :

Growth and characterization of BON thin films prepared by low frequency RF plasma enhanced MOCVD method

;;;;;;
[G.C. Chen;D.C. Lim;Lee, S.B.;B.Y. Hong;Kim, Y.J.;J.H. Boo;]

Center for Advanced Plasma Surface Technology, SungKyunKwan University;

한국표면공학회지, Vol. 34, No. 5, pp. 510-515.

DOI :

The Development of Cl-Plasma Etching Procedure for Si and SiO$_2$

;;;;
[Kim, Jong-Woo;Jung, Mi-Young;Park, Sung-Soo;Boo, Jin-Hyo;]

Center for Advanced Plasma Surface Technology, Sungkyunkwan University;Department of Physics, Sunmoon University;

한국표면공학회지, Vol. 34, No. 5, pp. 516-521.

DOI :