Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

Electrodeposited Multilayer Coating Systems

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[Gabe, David R.;]

International Union for Surface Finishing and Iptme, Loughborough Univ.;

한국표면공학회지, Vol. 32, No. 3, pp. 195-207.

DOI :

STUDY FOR DEVELOPMENT OF AN ADDITIVE FOR SEMI-BRIGHTNESS FINISH FOR NICKEL ELECTOPLATING

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[Han, M.K.;Lee, J.K.;]

Korea Institute of Industrial Technology (KITECH);

한국표면공학회지, Vol. 32, No. 3, pp. 208-210.

DOI :

Pb-FREE SOLDER PLATING

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[Yada, Y.;Tokio, K.;]

2nd Development Department, Research Center, Ebara-Udylite Co., Ltd.;

한국표면공학회지, Vol. 32, No. 3, pp. 211-213.

DOI :

THE EFFECTS OF ADDITIVES IN NICKEL AND COPPER ELECTROPLATING FOR MICROSTRUCTURE FABRICATION

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[Kim, Go-Eun;Lee, Jae-Ho;]

Dept. of Metallurgical Engineering and Materials Science Hongik University;

한국표면공학회지, Vol. 32, No. 3, pp. 214-218.

DOI :

Ferrous Chloride Pickling Bath A new process for pre-treatment of metals

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[Ericson, U.H.;Ericson, H.A.H.;]

Korrosionsforskning AB, Sweden;Corrint Svenska KB, Sweden;

한국표면공학회지, Vol. 32, No. 3, pp. 219-223.

DOI :

CHARACTERISTICS OF PLATED GOLD LAYER ON ANSI 304 STAINLESS STEEL ACCORDING TO THE VARIATION OF PRETREATMENTS AND ELECTROLYSIS CONDITIONS

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[Lee, Dong-hun;Lee, Jae-Bong;]

School of Metallurgical and Materials Engineering Kookmin University;

한국표면공학회지, Vol. 32, No. 3, pp. 224-234.

DOI :

ANALYSIS OF THE ANODIC OXIDATION OF SINGLE CRYSTALLINE SILICON IN ETHYLEN GLYCOL SOLUTION

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[Yuga, Masamitsu;Takeuchi, Manabu;]

Graduate School of Science and Engineering, Ibaraki University;Department of Electrical and Electronic Engineering, Ibaraki University;

한국표면공학회지, Vol. 32, No. 3, pp. 235-238.

DOI :

CHARACTERIZATION OF METALLIC CONTAMINATION OF SILICON WAFER SURFACES FOR 1G DRAM USING SYNCHROTRON ACCELERATOR

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[Kim, Heung-Rak;Kun-Kul, Ryoo;]

Research Institute of Industrial Science and Technology;Soonchunhyang University;

한국표면공학회지, Vol. 32, No. 3, pp. 239-243.

DOI :

PHOTOELECTRODEPOSITION OF COPPER ON BORON-DOPED DIAMOND FILMS: ITS APPLICATION TO CONDUCTIVE PATTERN FORMING ON DIAMOND AND DIAMOND PHOTOGRAPHIC PHENOMENON

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[Yoshihara, S.;Shinozaki, K.;Shirakashi, T.;]

Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University;

한국표면공학회지, Vol. 32, No. 3, pp. 244-248.

DOI :

BORIDING OF STEEL WITH PECVD METHOD

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[Lee, M.J.;Lee, K.Y.;Lee, J.H.;Kim, Y.H.;]

Dept. of Metallurgical Engineering and Materials Science Hongik University;

한국표면공학회지, Vol. 32, No. 3, pp. 249-252.

DOI :

INDUSTRIAL STATUS OF DRY PLATING AS AN ALTERNATIVE TO WET PLATING PROCESS IN KOREAN SURFACE FINISHING INDUSTRY

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[Kwon, Sik-Chol;Baek, Woon-Sung;Lee, Gun-Hwan;Rha, Jong-Joo;]

KIMM;

한국표면공학회지, Vol. 32, No. 3, pp. 253-256.

DOI :

THE EFFECT OF AN APPLIED BIAS UPON THE REFLECTANCE AND ADHESION OF SILVER FILMS BEING SPUTTER-DEPOSITED ON POLYESTER SUBSTRATE

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[Ri, Eui-Jae;Hoang, Tae-Su;]

KITech (SaengGiUeon);

한국표면공학회지, Vol. 32, No. 3, pp. 257-264.

DOI :

NEW PROGRESS IN TiN-BASED PROTECTIVE COATINGS DEPOSITED BY ARC ION PLATING

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[Huang, R.F.;Wen, L.S.;]

SES and City University of Hong Kong Hong Kong;Institute of Metal Research, Academia Sinica;

한국표면공학회지, Vol. 32, No. 3, pp. 265-275.

DOI :

ELECTRICAL PROPERTIES OF ELECTROCHROMIC INDIUM NITRIDE THIN FILMS PREPARED BY RF ION PLATING

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[Asai, N.;Inoue, Y.;Sugimura, H.;Takai, O.;]

Department of Materials Processing Engineering, Graduate School of Engineering, Nagoya University;

한국표면공학회지, Vol. 32, No. 3, pp. 276-280.

DOI :

MICROSTRUCTURE AND ELECTROCHEMICAL CHARACTERISTICS OF ELECTRODEPOSITED Zn-Ni ALLOY COATINGS

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[Short, N.R.;Hui, Wen-Hua;Dennis, J.K.;]

School of Engineering and Applied Science, Aston University;Department of Materials Science & Engineering, Stevens Institute of Technology;

한국표면공학회지, Vol. 32, No. 3, pp. 281-288.

DOI :

THE RECENT TREND OF BUILD-UP PRINTED CIRCUIT BOARD TECHNOLOGIES

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[Takagi, Kiyoshi;]

TAKAGI Associates;

한국표면공학회지, Vol. 32, No. 3, pp. 289-296.

DOI :

INFRARED ABSORPTION MEASUREMENT DURING LOW-TEMPERATURE PECVD OF SILICON-OXIDE FILMS

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[Inoue, Yasushi;Sugimura, Hiroyuki;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 32, No. 3, pp. 297-302.

DOI :

EFFECT OF SUBSTRATE BIAS ON THE DIAMOND GROWTH USING MICROWAVE PLASMA CVD

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[Sakamoto, Yukihiro;Takaya, Matsufumi;]

Chiba Institute of Technology, Precision Engineering;

한국표면공학회지, Vol. 32, No. 3, pp. 303-306.

DOI :

PREPARATION OF HYDROXYAPATITE COATINGS USING R.F. MAGNETRON SPUTTERING

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[Hosoya, Satoru;Sakamoto, Yukihiro;Hashimoto, Kazuaki;Takaya, Matsufumi;Toda, Yoshitomo;]

Graduate school, Chiba Institute of Technology;Department of Precision Engineering, Chiba Institute of Technology;Department of Industrial Chemistry, Chiba Institute of Technology;

한국표면공학회지, Vol. 32, No. 3, pp. 307-311.

DOI :

REACTION STEPS OF A FORMATION OF THE BLACK LAYER BEIWEEN IRON NTIRIDE AND TiN COATING

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[Baek, W.S.;Kwon, S.C.;Lee, J.Y.;Rha, J.J.;Lee, S.R.;Kim, K.H.;]

Korea Institute of Machinery and Materials (KIMM);Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST);Department of Metallurgy and Material, Yeungnam Univ.;

한국표면공학회지, Vol. 32, No. 3, pp. 312-316.

DOI :

TEXTURE AND RELATED PHENOMENA OF ELECTRODEPOSITS

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[Lee, D.N.;]

Division of Materials Science and Engineering, and Research Center for Thin Film Fabrication and Crystal Growing of Advanced Materials, Seoul National University;

한국표면공학회지, Vol. 32, No. 3, pp. 317-330.

DOI :

ELECTROLESS PLATING OF NICKEL FOR MICRO-STRUCTURE FABRICATION

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[Jin, Huh;Lee, Jae-Ho;]

Dept. of Metallurgical Engineering and Materials Science, Hongik University;

한국표면공학회지, Vol. 32, No. 3, pp. 331-335.

DOI :

PHOTOCATALYTIC REACTION OF $TiO_2$ FOR PURIFICATION OF AIR

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[Yin, X.J.;Cai, R.X.;]

Chemical Process & Biotechnology Department, Singapore Polytechinc;Chemical Technology Centre, Singapore Productivity and Standards Board;

한국표면공학회지, Vol. 32, No. 3, pp. 336-339.

DOI :

ELECTRICAL BREAKDOWN INITIATION OF ANODIC FILMS DURING ANODIZING IN MOLTEN BISULPHATE MELT

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[Han, S.H.;Thompson, G.E.;]

Cleaner Production Centre, Korea Institute of Industrial Technology;Corrosion and Protection Centre, University of Manchester Institute of Science and Technology;

한국표면공학회지, Vol. 32, No. 3, pp. 341-343.

DOI :

EFFECT OF ARGON AND OXYGEN PLASMAS ON VARIOUS POLYETHYLENE SHEETS

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[Chen, Yashao;Hirayama, Naoki;Gomi, Masaki;Kiuchi, Kenji;Momose, Yoshihiro;]

Department of Materials Science, Ibaraki University;

한국표면공학회지, Vol. 32, No. 3, pp. 344-350.

DOI :

MODIFICATION OF INITIALLY GROWN BN LAYERS BY POST-N$^{+}$ IMPLANTATION

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[Byon, E.S.;Lee, S.H.;Lee, S.R.;Lee, K.H.;J. Tian;Youn, J.H.;Sung, C.;]

Korea Institute of Machinery & Materials;Harbin Institute of Technology;Changwon National University;Center for Advanced Materials, University of Massachusetts;

한국표면공학회지, Vol. 32, No. 3, pp. 351-355.

DOI :

HYDROXYAPATITE GRANULE IMPLANTED Ti-ALLOY

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[Nonami, Toru;Taoda, Hiroshi;Kamiya, Akira;Naganuma, Katsuyoshi;Sonoda, Tsutomu;Kameyama, Tetsuya;]

National Industrial Research Institute of Nagoya;

한국표면공학회지, Vol. 32, No. 3, pp. 356-359.

DOI :

INVESTIGATION OF "STEPPED" DISCHARGE CURVES IN SINTERED TYPE NICKEL-CADMIUM CELL

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[Sasaki, Y.;Yamashita, T.;]

Faculty of Engineering, Kanto Gakuin University;

한국표면공학회지, Vol. 32, No. 3, pp. 360-362.

DOI :

DISCHARGE CHARACTERISTICS OF NICKELOXIDE ELECTRODE PREPARED FROM ELECTROCHEMICAL IMPREGNATION

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[Takenoya, K.;Sasaki, Y.;Yamashita, T.;]

Faculty of Engineering, Kanto Gakuin University;

한국표면공학회지, Vol. 32, No. 3, pp. 363-365.

DOI :

ON THE SONO-VOLTAMMETRY CURVES OF POLYCRYSTALLINE PLATINUM ELECTRODE IN SULFURIC ACID SOLUTION

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[Chiba, Atsushi;Kobayashi, Katsuyoshi;Yamashita, Tsugito;]

Department of Materials Chemistry, Yokohama National University;Department of Industrial Chemistry, Kantogakuin Uneversity;

한국표면공학회지, Vol. 32, No. 3, pp. 366-371.

DOI :

CRYSTAL ORIENTATION OF ELECTROLESS COPPER AND ELECTRODEPOSITED NICKEL FILMS ON THE MAGNETS

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[Chiba, Atsushi;Kobayashi, Katsuyoshi;Miyazaki, Hiroki.;Yoshihara, Sachio;Wu, Wen-Chang;]

Department of Materials Chemistry, Yokohama National University;Department of Industrial Chemistry, Utsunomiya University;Department of Chemical Engineering, Nan-Tai, Institute of Technology.;

한국표면공학회지, Vol. 32, No. 3, pp. 372-376.

DOI :

EFFECTS OF AMINES ON COPPER ETCHING WITH H$_2$SO$_4$-$H_2O$$_2$ SYSTEMS

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[Kobayashi, Katsuyoshi;Minami, Naoki;Chiba, Atsushi;]

Department of Materials Chemistry, Yokohama National University;Department of Research and Development, Ferric Inc.;

한국표면공학회지, Vol. 32, No. 3, pp. 377-384.

DOI :

Electron field emission from various CVD diamond films

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[Usikubo, Koji;Sakamoto, Yukihiro;Takaya, Matsufumi;]

Graduate school, Chiba Institute of Technology;Chiba Institute of Technology;

한국표면공학회지, Vol. 32, No. 3, pp. 385-388.

DOI :

VOID DEFECTS IN COBALT-DISILICIDE FOR LOGIC DEVICES

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[Song, Ohsung;Ahn, Youngsook;]

Department of Materials Science and Engineering, The University of Seoul;

한국표면공학회지, Vol. 32, No. 3, pp. 389-392.

DOI :

THE SURFACE CHARACTERISTICS OF NITROGEN ION IMPLANTED IRON ALUMINIDES

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[Choe, Han-Cheol;]

Dept. of Metallurgical Engineering & IAGC Research Institute, Kwang Yang College;

한국표면공학회지, Vol. 32, No. 3, pp. 393-400.

DOI :

THE EFFECT OF PROCESS CONDITIONS ON THE PHYSICAL PROPERTIES OF SILVER FILMS PREPARED BY USING SPUTTERING ON POLYESTER SUBSTRATE

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[Hoang, Tae-Su;Ri, Eui-Jae;]

KITech (SaengGiUeon);

한국표면공학회지, Vol. 32, No. 3, pp. 401-405.

DOI :

THE REFLECTANCE AND ADHESION OF SILVER FILMS PREPARED BY USING E-BEAM EVAPORATION ON POLYESTER SUBSTRATE

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[Ri, Eui-Jae;Hoang, Tae-Su;]

KITech (SaengGiUeon);

한국표면공학회지, Vol. 32, No. 3, pp. 406-409.

DOI :

ADHESION STUDIES OF MAGNETRON-SPUTTERED COPPER FILMS ON INCONEL SUBSTRATES

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[Lee, G.H.;Kwon, S.C.;Lee, S.Y.;]

Surface Engineering Laboratory, KIMM;Assessment & Planning, STEPI;

한국표면공학회지, Vol. 32, No. 3, pp. 410-415.

DOI :

A Study of Dry Etch Mechanism of the GaN using Plasma Mass Spectrometry

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[Kim, H.S.;Lee, W.J.;Jang, J.W.;Yeom, G.Y.;Lee, J.W.;Kim, T.I.;]

Dept. of Materials Engineering, Sungkyunkwan University;Photonics Lab., Samsung Advanced Institute of Technology;

한국표면공학회지, Vol. 32, No. 3, pp. 416-422.

DOI :

Plating of Permalloy Using Flow Cell

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[Jeon, S.H.;Ahn, J.H.;Kang, T.;]

School of Materials Science and Engineering, Seoul National University;

한국표면공학회지, Vol. 32, No. 3, pp. 423-427.

DOI :

EFFECT OF ION BEAM ASSISTED CLEANING ON ADHESION OF ALUMINIUM TO POLYMER SUBSTRATE OF PC AND PMMA

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[Kwon, Sik-Chol;Lee, Gun-Hwan;Lee, Chuel-Yong;Gob, Han-Bum;Lim, Jun-Seop;Goh, Sung-Jin;]

Surface Engineering Laboratory, KIMM;Aju Engineering Co.;

한국표면공학회지, Vol. 32, No. 3, pp. 428-432.

DOI :

PROPERTIES OF Mo COMPOUNDS AS A DIFFUSION BARRIER BETWEEN Cu AND Si PREPARED BY CO-SPUTTERING

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[Lee, Yong-Hyuk;Park, Jun-Yong;Bae, Jeong-Woon;Yeom, Geun-Young;]

Department of Materials Engineering, SungKyunKwan University;

한국표면공학회지, Vol. 32, No. 3, pp. 433-439.

DOI :

CRYSTAL TRANSITION PROCESS DURING POST-BREAKDOWN IN THE MOLTEN SALT

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[Han, S.H.;Thompson, G.E.;]

Cleaner Production Centre, Korea Institute of Industrial Technology;Corrosion and Protection Centre, University of Manchester Institute of Science and Technology;

한국표면공학회지, Vol. 32, No. 3, pp. 440-443.

DOI :

A STUDY ON COPPER DEPOSITION PROCESS DURING ANODIC OXIDATION OF ALUMINIUM ALLOY

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[Koh, I.S.;Han, S.H.;Shin, D.H.;]

Department of Metal & Material Science Engineering, Hanyang University;Cleaner Production Centre, Korea Instituteof Industrial Technology;

한국표면공학회지, Vol. 32, No. 3, pp. 444-446.

DOI :

ELECTROCHEMICAL STUDY OF ELECTROLESS PLATING OF SILVER

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[Lee, Jae-Ho;]

Dept. of Metallurgical Engineering and Materials Science, Hong Ik University;

한국표면공학회지, Vol. 32, No. 3, pp. 447-451.

DOI :

CORROSION BEHAVIOR OF Al-Zn ALLOY AS A SACRIFICIAL ANODE OF ORV TUBES

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[Jin, Huh;Lee, Ho-Kyun;Lee, Jae-Ho;]

Dept. of Metallurgical Engineering and Materials Science Hongik University;

한국표면공학회지, Vol. 32, No. 3, pp. 452-455.

DOI :

CONDUCTIVE SnO$_2$ THIN FILM FABRICATION BY SOL-GEL METHOD

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[Lee, Seung-Chul;Lee, Jae-Ho;Kim, Young-Hwan;]

Dept. of Metallurgical Engineering and Materials Science, Hong Ik University;

한국표면공학회지, Vol. 32, No. 3, pp. 456-460.

DOI :

DIAMOND-LIKE CARBON FILMS FOR ANTIREFLECTION COATINGS OF GERMANIUM INFRATED OPTICAL LENSES

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[Kim, Seong-Young;Lee, Sang-Hyun;Lee, Jai-Sung;]

Advanced Consumer Products R&D Center, KITECH;Depart. of Metallurgy and Materials Science, Hanyang University;

한국표면공학회지, Vol. 32, No. 3, pp. 461-466.

DOI :

DEPOSITION OF c-BN FILMS BY PULSED DC BIASING IN MAGNETICALLY ENHANCED ARE METHOD

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[Lee, S.H.;Byon, E.S.;Lee, K.H.;J., Tian;Yoon, J.H.;Sung, C.;Lee, S.R.;]

Korea Institute of Machinery & Materials;Harbin Institute of Technology;Changwon National University;Center for Advanced Materials,University of Massachusetts,Lowell,MA 01854,U.S.A;

한국표면공학회지, Vol. 32, No. 3, pp. 467-471.

DOI :

Improvement of the Corrosion Resistance of PVD Hard Coating/Substrate Systems - Recent Developments -

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[Jehn, Hermann A.;Kang, Sung-Goon;]

Forschungsinstitut fur Edelmetalle und Metallchemie;Hanyang University, Department of Materials Engineering;

한국표면공학회지, Vol. 32, No. 3, pp. 472-483.

DOI :