Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

EFFECT OF ALUMINIDE-YTTRIUM COMPOSITE COATING ON THE OXIDATION RESISTANCE OF TiAl ALLOY

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[Jung, Hwan-Gyo;Kim, Jong-Phil;Kim, Kyoo-Young;]

Pohang University of Science and Technology Center for Advanced Aerospace Materials;

한국표면공학회지, Vol. 29, No. 6, pp. 607-614.

DOI :

FORMATION OF IRON SULFIDE BY PLASMA-NITRIDING USING SUBSIDIARY CATHODE

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[Hong, Sung-Pill;Urao, Ryoichi;Takeuchi, Manabu;Kojima, Yoshitaka;]

Graduate School, Ibaraki University;Materials Science, School of Engineering, Ibaraki University;Hitachi Laboratory, Hitachi Ltd. Co.;

한국표면공학회지, Vol. 29, No. 6, pp. 615-620.

DOI :

PREFERRED ORIENTATION AND MICROSTRUCTURE OF MOD DERIVED SrBi$_{2x}$Ta$_2$O$_9$ THIN FILMS WITH Bi CONTENT x

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[Yeon, Dae-Joong;Park, Joo-Dong;Oh, Tae-Sung;]

Department of Metallurgy and Materials Science, Hong Ik University;

한국표면공학회지, Vol. 29, No. 6, pp. 621-627.

DOI :

SOFT MAGNETISM OF Co-Zr AND Fe-Co FILMS WITH LARGE SATURATION MAGNETIZATION

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[Suemitsu, Katsumi;Nakagawa, Shigeki;Naoe, Masahiko;]

Department of Physical Electronics, Tokyo Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 628-633.

DOI :

STUDIES ON THE HIGH TEMPERATURE PROPERTIES OF DUPLEX-TREATED AISI H13 STEEL

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[Chung, J.W.;Lee, S.Y.;Kim, C.W.;Kim, S.S.;Han, J.G.;Lee, S.Y.;]

Plasma Applied Materials Laboratory, Dept. of Mater. Eng. Hankuk Aviation University;Plasma Applied Materials Laboratory, Dept. of Metall. Eng., Sungkyunkwan University;Mater. Forming Group, Korea Inst. of Mach. and Metals;

한국표면공학회지, Vol. 29, No. 6, pp. 634-639.

DOI :

STUDY OF CATALYSIS FOR MAKING ALCOHOL FROM ACROLEIN AND ISOPROPYL ALCOHO

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[Nagase, Yoshinori;]

Department of Materials Science, Faculty of Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 640-643.

DOI :

IMPROVEMENT OF DISTRIBUTION OF COERCIVITY IN CO-CR FILMS DEPOSSSITED BY FACING TARGETS SPUTTERING

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[Takayama, Seiryu;Nakagawa, Shigeki;Kim, Kyung-Hwan;Naoe, Masahiko;]

Dept. of Physical Electronics, Tokyo Institute of Technology;Dept. of Electrical Electronics, Kyung Won University;

한국표면공학회지, Vol. 29, No. 6, pp. 644-647.

DOI :

OPTICAL EMISSION SPECTROSCOPY OF Ch$_4$/Ar/H$_2$ GAS DISCHARGES IN RF PLASMA CVD OF HYDROGENATED AMORPHOUS CARBON FILMS

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[Lee, Sung-Soo;Osamu Takai;]

Department of Materials Processing Engineering, School of Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 6, pp. 648-653.

DOI :

SIMULTANEOUS DETERMINATION OF OPTICAL CONSTANTS AND DEPTH-PROFILE OF SPUTTERED AMORPHOUS TiO$_2$ THIN FILMS

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[Rhee, Sung-Gyu;Lee, Soon-Il;Oh, Soo-Ghee;]

Department of Physics, Ajou University;

한국표면공학회지, Vol. 29, No. 6, pp. 654-659.

DOI :

OPTICAL PROPERTIES OF INDIUM OXIDE AND INDIUM TIN OXIDE FILMS PREP ARED BY SPUTTERING

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[Fujita, Yasuhiko;Kitakizaki, Kaoru;]

Department of Electronic Systems Engineering, Tokyo Metropolitan Institute of Technology;Research Development Headquarters, Meidensha Corporation;

한국표면공학회지, Vol. 29, No. 6, pp. 660-665.

DOI :

EFFECT OF ANNEALING ON THE OPTICAL PROPERTY OF RF-SPUTTERED CdTe THIN FILM

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[Lee, Dong-Young;Lee, Soon-Il;Oh, Soo-Ghee;]

Department of Physics, Ajou University;

한국표면공학회지, Vol. 29, No. 6, pp. 666-672.

DOI :

ENHANCEMENT OF PHOTOVOLTAIC PERFORMANCE IN COPPER PHTHALOCYNINE THICK FILM SOLAR CELLS

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[Ruiono, Yo Tomota;Momose, Yoshihiro;Takeuchi, Manabu;]

Department of Meterials and Electronic Engineering, Ibaraki University;Department of Electrical and Electronic Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 673-677.

DOI :

PLASMA THIN FILMS PREVENTING CHLORIDE LONS FROM INTERFERING WITH THE NERNSTIAN pH-RESPONSE OF PLATINUM ELECTRODE SURFACE

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[Yajima, Tastuhiko;]

Saitama Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 678-682.

DOI :

MO-COMPOUNDS AS A DIFFUSION BARRIER BETWEEN Cu AND Si

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[Kim, Ji-Hyung;Lee, Yong-Hyuk;Kwon, Yong-Sung;Yeom, Geun-Young;Song, Jong-Han;]

Department of Materials Engineering, Sungkyunkwan University;Department of Physics, Sungkyunkwan University;Korea Institute of Science and Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 683-690.

DOI :

SCRATCH TESTERS ON THE APPLICATION TO THE ADHESION MEASUREMENT OF THIN COATINGS

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[Takeshita, Kyo;]

RHESCA Co., Ltd.;

한국표면공학회지, Vol. 29, No. 6, pp. 691-694.

DOI :

THE EFFECT OF SPRAYING PARAMETEES ON THE PROPERTIES OF HYDROXYAPATITE COATUNG

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[Park, K.S.;Huh, W.T.;Son, Y.H.;Kim, C.K.;Kim, S.Y.;Kim, S.G.;Kim, S.W.;]

New-Tech Co., Ltd.;Department of Materials Engineering, Yeungnam University;Production Technology Center, KAITECH;

한국표면공학회지, Vol. 29, No. 6, pp. 695-702.

DOI :

AN APPLICATION OF PLASMA-POLYMERIZED YbPc$_2$ FILM: HUMIDITY SENSOR

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[Yamana, Masao;Kashiwazaki, Naoya;]

Department of natural sciences, Faculty of Science and Engineering, Tokyo Denki University;Dept. of natural sciences, Faculty of Engineering, Tokyo Denki Univ.;

한국표면공학회지, Vol. 29, No. 6, pp. 703-708.

DOI :

PREPARATION OF ANISOTROPIC CONDUCTIVE FINE PARTICLES BY ELECTROLESS NICKEL PLATING.

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[Fujinami, T.;Watanabe, J.;Motizuki, I.;Honma, H.;]

Faculty of Engineering Kanto Gakuin University;

한국표면공학회지, Vol. 29, No. 6, pp. 709-713.

DOI :

GOLD WIRE BONDABILITY OF ELECTROLESS GOLD PLATING USING DISULFITEAURATE COMPLEX

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[Abe, Shinji;Watanabe, Hideto;Igarashi, Yasushi;Honma, Hideo;]

Fac. of Eng. Kanto Gakuin University;

한국표면공학회지, Vol. 29, No. 6, pp. 714-719.

DOI :

FORMATION OF AMORPHOUS NICKEL-PHOSPHORUS ALLOY FILM

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[Yamashita, Tsugito;Komiyama, Toyohiko;]

Department of Industrial Chemistry, Kanto Gakuin University;

한국표면공학회지, Vol. 29, No. 6, pp. 720-723.

DOI :

PREPARATION OF NICKEL HYDROXIDE FOR NICKEL-CADMIUM CELL

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[Sasaki, Yasushi;Yamashita, Tsugito;]

Faculty of Engineering Kanto Gakuin University;

한국표면공학회지, Vol. 29, No. 6, pp. 724-727.

DOI :

SURFACE CHARACTERIZATION OF CU ELECTRODES IN ELECTROCHEMICAL REDUCTION OF $CO_2$ BY CORE LEVEL X-RAY PHOTOELECTRON SPECTROSCOPY AND VALENCE LEVEL PHOTOELECTRON EMISSION MEASUREMENT

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[Terunuma, Y.;Saitoh, A.;Momose, Y.;]

Department of Materials Science, Faculty of Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 728-734.

DOI :

ELECTROCHROMIC BEHAVIOR OF AMORPHOUS NICKELPHTHALOCYANINE THIN FILMS

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[Masui, Masayoshi;Suzuki, Masato;Kaneko, Fujio;Takeuchi, Manabu;]

Faculty of Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 735-738.

DOI :

PARAMETER STUDY ON PLASMA-POLYMERIZATION OF LANTHANIDE DIPHTHALOCYANINE FILMS FOR ELECTROCHEMICAL DEVICES

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[Kashiwazaki, Naoya;Yamana, Masao;]

Department of natural sciences Faculty of Engineering, Tokyo Denki University;Department of natural sciences, Faculty of Science and Engineering, Tokyo Denki University;

한국표면공학회지, Vol. 29, No. 6, pp. 739-744.

DOI :

WEAR PROPERTY OF PLASMA-SPRAYED COATING LAYERA IN Cr$_2$O$_3$

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[Pakr, J.M.;Lee, S.W.;Kim, Byong-Kee;Lee, Dong-Won;]

Department of Materials Engineering, Sun Moon University;Korean Institute of Machery and Materials, Department of Materials Processing;

한국표면공학회지, Vol. 29, No. 6, pp. 745-752.

DOI :

CHARACTERIZATIONS OF TILTED SUPERLATTICE QUANTUM WIRE GROWN BY MIGRATION ENHANCED EPITAXY METHOD

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[Kim, D.W.;Woo, J.C.;]

Dept. of Physics, Sun Moon University;Dept. of Physics, Seoul National University;

한국표면공학회지, Vol. 29, No. 6, pp. 753-759.

DOI :

LOW TEMPERATURE DEPOSITION OFSIOx FILMS BY PLASMA-ENHANCED CVD USING 100 kHz GENERATOR

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[Kakinoki, Nobuyuki;Suzuki, Takenobu;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 6, pp. 760-765.

DOI :

INVESTIGATIONS OF OXIDATIONS OF SnOx AND ITS CHANGES OF THE PROPERTIES PREPARED BDEPOSITIONY REACTIVE ION-ASSISTED

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[Cho, J.S.;Choi, W.K.;Kim, Y.T.;Jung, H.J.;Koh, S.K.;]

Division of Ceramics, Korea Institute and Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 766-772.

DOI :

LOW TEMPERATURE DEPOSITION OF SILICON OXIDE FILMS BY UV-ASSOSTED RF PLASMA-ENHANCED CVD

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[Hozumi, Atsushi;Sugimoto, Nobuhisa;Sekoguchi, Hiroki;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 6, pp. 773-780.

DOI :

EVALUATION OF WATER REPELLENCY FOR SILICON OXIDE FILMS PREPARED BY RF PLASMA-ENTRANCED CVD

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[Sekoguchi, Hiroki;Hozumi, Atsuhi;Kakionoki, Nobuyuki;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 6, pp. 781-787.

DOI :

OBSERV ATION OF MICRO-STRUCTURE AND OPTICAL PROPERTISE OF TITANIUM DIOXIDE THIN FILMS USING OPTICAL MMEHODS

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[Kim, S.Y.;Kim, H.J.;]

Department of Physics, Ajou University;

한국표면공학회지, Vol. 29, No. 6, pp. 788-796.

DOI :

DEPOSITION OF A-SIC:H FILMS ON AN UNHEATED SI SUBSTRATE BY LOW FREQUENCY (50Hz) PLASMA Cvd

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[Shimozuma, M.;Ibaragi, K.;Yoshion, M.;Date, H.;Yoshida, K.;Tagashira, H.;]

College of Medical Technology, Hokkaido University;Department of Electrical Engineering, Hokkaido University;Hokkaido Polytechnic College;Kitami Institute of Technology;Hokkaido Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 797-802.

DOI :

MATERIAL AND ELECTICAL CHARACTERISTICS OF COPPER FILMS DEPOSITED BY MATAL-ORGANIC CHEMICAL TECHNIQUE

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[Cho, Nam-Ihn;Park, Dong-Il;Nam, H. Gin;]

Dept. Electronic Engineering, Sun Moon University;

한국표면공학회지, Vol. 29, No. 6, pp. 803-808.

DOI :

CHARACTERISTICS OF HETEROEPITAXIALLY GROWN $Y_2$O$_3$ FILMS BY r-ICB FOR VLSI

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[Choi, S.C.;Cho, M.H.;Whangbo, S.W.;Kim, M.S.;Whang, C.N.;Kang, S.B.;Lee, S.I.;Lee, M.Y.;]

Department of Physics, Yonsei University;Semiconductor Research Center, Samsung Electronics Co., Ltd.;

한국표면공학회지, Vol. 29, No. 6, pp. 809-815.

DOI :

CHARACTERISITCS OF CHLORINE IND DUCTIVELY COUPLED PLASMAS AND THEIR SILICON ETCH PROPERTIES

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[Lee, Young-Jun;Kim, Hyeon-Soo;Yeom, Geun-Young;Oho, Kyung-Hee;]

Department of Materials Engineering, Sung Kyun Kwan University;National Institute of Technology and Quality;

한국표면공학회지, Vol. 29, No. 6, pp. 816-823.

DOI :

OPTIMAL SPUTTERING CONDITIONS FOR HIGH-DENSITY MAGNETIC RECORDING MEDIA BY FTS

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[Noda, Kohki;Kawanabe, Takashi;Naoe, Masahiko;]

IBM Japan;Tokyo Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 824-828.

DOI :

COMPOSITION OF SUPERCONDUCTING YBCO THIN FILMS WITH RF REACTIVE SPUTTERING CONDITIONS

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[Kim, H.H.;Kim, S.;Shin, S.H.;Park, J.I.;Park, K.J.;]

Department of Electronic Engineering, Doowon Institute of Technology;Inorganic Chemistry Department, National Institute of Technology and Quality;

한국표면공학회지, Vol. 29, No. 6, pp. 829-833.

DOI :

PLASMA DIAGNOSIS OF FANING TARGETS SPUTTERING SYSTEM FOR DEPOSITION OF BA FERRITE FILMS IN Ar, Xe AND $O_2$ GAS MIXTURE

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[Matsushita, Nobuhiro;Noma, Kenji;Nakagawa, Shigeki;Naoe, Masahiko;]

Dept. of Physical Electronics, Tokyo Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 834-838.

DOI :

GROWTH AND ELECTRICAL PROPERTIES OF (La,Sr)CoO$_3$/Pb(Zr,Ti)O$_3$/(La,Sr)CoO$_3$ HETEROSTRUCTURES FOR FIELD EFFECT TRANSISTOR

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[Lee, J.;Kim, S.W.;]

Department of Materials Engineering, Sung Kyun Kwan University;

한국표면공학회지, Vol. 29, No. 6, pp. 839-846.

DOI :

EFFECT OF PARAMAGNETIC Co$_{67}$Cr$_{33}$ UNDERLAYER ON CRYSTALLOGRAPHIC AND MAGNETIC CHARACTERISTICS OF Co-Cr-Ta LAYERS IN PERPENDICULAR MAGNETIC RECORDING MEDIA

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[Kim, Kyung-Hwan;Nakagawa, Shigeki;Takayama, Seiryu;Naoe, Masahiko;]

Dept. of Electrical Electronics, Kyung Won University;Dept. of Physical Electronics, Tokyo Institute of Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 847-850.

DOI :

STRUCTURAL ANALYSIS OF COPPER PHTHALOCYANINE THIN FILMS FABRICATED BY PLASMA-ACTIVATED EVAPORATION

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[Kim, Jun-Tae;Jang, Seong-Soo;Lee, Soon-Chil;Lee, Won-Jong;]

Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology;Department of Physics, Korea Advanced Institute of Science and technology;Department of Physics, Korea Adcanced Institute of Science and technology;

한국표면공학회지, Vol. 29, No. 6, pp. 851-856.

DOI :

FABRICATION AND MICROSTRUCTURES OF Al-Li ALLOY PARTICLE-FILMS BY RF-PLASMA TECHNIQUE

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[Yoshizawa, Isao;Ono, Tomoko;]

Laboratory of physics, Faculty of Education, Ibaraki University;

한국표면공학회지, Vol. 29, No. 6, pp. 857-861.

DOI :

EFFECT OF DEPOSITION METHODS ON PHYSICAL PROPERTIES OF POLYCRYSTALLINE CdS

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[Lee, Y.H.;Cho, Y.A.;Kwon, Y.S.;Yeom, G.Y.;Shin, S.H.;Park, K.J.;]

Department of Physics, Sung Kyun Kwan University;Department of Materials Engineering, Sung Kyun Kwan University;National Institute of Technology and Quality;

한국표면공학회지, Vol. 29, No. 6, pp. 862-868.

DOI :

ICP ETCHING OF TUNGSTEN FOR X-RAY MASKS

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[Jeong, C.;Song, K.;Park, C.;Jeon, Y.;Lee, D.;Ahn, J.;]

Department of Materials Engineering, Hanyang University;LG Electronics Research Center;

한국표면공학회지, Vol. 29, No. 6, pp. 869-875.

DOI :

DOPING EFFICIENCIES OF OXYGEN VACANCY AND SN DONOR FOR ITO AND InO THIN FILMS

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[Chihara, Koji;Honda, Shin-ichi;Watamori, Michio;Oura, Kenjiro;]

Department of Electric Engineering, Faculty of Engineering, Osaka University;

한국표면공학회지, Vol. 29, No. 6, pp. 876-879.

DOI :

CHARACTERIXATION OF PLASMA ION IMPLANTED SURFACES USING TIME-OF-FLIGHT SECONDARY ION MASS SPECTROMATRY

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[Lee, Yeon-Hee;Han, Seung-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon;]

Advanced Analysis Center, Korea Institute of Science and Technology;

한국표면공학회지, Vol. 29, No. 6, pp. 880-883.

DOI :

ADSORPTION OF ATOMIC-HYDROGAN ON THE Si(100)-(2$ imes$l)-SB SURFACE STUDIED BY TOF-ICISS/LEED

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[Ryu, Jeong-Tak;Kui, Koichiro;Katayama, Mitsuhiro;Oura, Kenjiro;]

Department of Electronic Engineering, Faculty of Engineering, Osaka University;

한국표면공학회지, Vol. 29, No. 6, pp. 884-890.

DOI :