Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

TEXTURE AND RELATED MICROSTRUCTURE AND SURF ACE TOPOGRAPHY OF VAPOR DEPOSITS

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[Lee, Dong-Nyung;]

School of Materials Science and Engineering Seoul National University;

한국표면공학회지, Vol. 29, No. 5, pp. 301-313.

DOI :

SCANNING PROBE NANOPROCESSING

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[Sugimura, Hiroyuki;Nakagiri, Nobuyuki;]

Tsukuba Research Laboratory, Nikon Corporation;

한국표면공학회지, Vol. 29, No. 5, pp. 314-324.

DOI :

MOVPE GROWTH OF HgCdTe EPILAYER WITH ARSENIC DOPING

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[Suh, Sang-Hee;Kim, Jin-Sang;Song, Jong-Hyeong;Kim, Je-Won;]

Korea Institute of Science and Technology;Korea University;

한국표면공학회지, Vol. 29, No. 5, pp. 325-329.

DOI :

PROPOSE NEW MIXTURE TARGET FOR LOW-TEMPERATURE AND HIGH- RATE DEPOSITION OF PZT THIN FILMS BY REACTIVE SPUTTERING

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[Hata, Tomonobu;Zhang, WeiXiao;Sasaki, Kimihiro;]

Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University;

한국표면공학회지, Vol. 29, No. 5, pp. 330-337.

DOI :

COMPARISON OF PLASMA-INDUCED SURFACE DAMAGES IN VARIOUS PLASMA SOURCES

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[Yi, Dong-Hyen;Lee, Jun-Sik;Kim, Sang-Kyun;Kim, Jae-Jeong;]

Advanced Technology R&D Laboratories, LG Semicon Co. Ltd.;

한국표면공학회지, Vol. 29, No. 5, pp. 338-344.

DOI :

POLYMER SURFACE MODIFICATION WITH PLASMA SOURCE ION IMPLANTATION TECHNIQUE

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[Han, Seung-Hee;Lee, Yeon-Hee;Lee, Jung-Hye;Yoon, Jung-Hyeon;Kim, Hai-Dong;Kim, Gon-ho;Kim, GunWoo;]

Advanced Analysis Center, Korea Institute of Science and Technology;Department of Chemistry, Kyunghee University;Department of Physics, Hanyang University;

한국표면공학회지, Vol. 29, No. 5, pp. 345-349.

DOI :

VHF-PECVD OF Ti/TiN WITH SILANE REDUCTION PROCESS

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[Mizuno, Shigeru;]

ANELVA Corpotation, Yotsuya;

한국표면공학회지, Vol. 29, No. 5, pp. 350-356.

DOI :

APPLICATION OF RADIO-FREQUENCY (RF) THERMAL PLASMA TO FILM FORMATION

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[Terashima, Kazuo;Yoshida, Toyonobu;]

The University of Tokyo, Graduate School of Engineering, Department of Metallurgy and Materials Science;

한국표면공학회지, Vol. 29, No. 5, pp. 357-362.

DOI :

SYNTHESIS OF CARBON NITRIDE THIN FILMS BY PLASMA PROCESSING

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[Takai, Osamu;Taki, Yusuke;Kitagawa, Toshihisa;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 363-370.

DOI :

NEW APPLICATIONS OF R.F. PLASMA TO MATERIALS PROCESSING

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[Akashi, Kazuo;Ito, Shigru;]

Science University of Tokyo;

한국표면공학회지, Vol. 29, No. 5, pp. 371-378.

DOI :

THIN FILM ADHESION IN Cu/Cr/POLYIMIDE AND Cu/Cu-Cr/POLYIMIDE SYSTEMS

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[Joh, Cheol-Ho;Kim, Young-Ho;Oh, Tae-Sung;Park, Ik-Sung;Yu, Jin;]

Dept. of Materials Engineering, Hanyang University;Dept. of Metall. and Mater. Sci., Hongik University;Dept. of Mater. Sci. and Eng., KAIST;

한국표면공학회지, Vol. 29, No. 5, pp. 379-385.

DOI :

MAGNETORESISTANCE OF EPITAXIALLY GROWN METALLIC MULTILAYERS

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[Kamada, Yasuhiro;Saza, Yasuyuki;Matsui, Masaaki;]

Department of Materials Science and Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 386-392.

DOI :

SOFT MAGNETIC PROPERTIES OF FeTaNC NANOCRYSTALLINE FILMS

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[Koh, Tae-Hyuk;Shin, Dong-Hoon;Choi, Woon;Ahn, Dong-Hoon;Nam, Seoung-Eui;Kim, Hyoung-June;]

Dept. of Met. & Mater. Sci., Hong-ik Univ.;Mater. Sci., Hong-ik Univ.;Multimedia Lab. LG Electronics;

한국표면공학회지, Vol. 29, No. 5, pp. 393-398.

DOI :

PREFERRED ORIENTATION OF TIN FILM STUDIED BT A REAL TIME SYNCHROTRON X-RAY SCATTERING

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[Je, J.H.;Noh, D.Y.;]

Dept. of Matls Sci. & Eng., Pohang University of Science & Technology;Dept. of Matls Sci. & Eng., Kwangju University of Science & Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 399-406.

DOI :

THIN FILM GROWTH AND SURFACE REACTION ON H-TERMINATED SILICON SURFACE

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[Yasuda, Yukio;Zaima, Shigeaki;]

Department of Crystalline Materials Science, School of Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 407-414.

DOI :

THIN FILM TECHNOLOGIES RELATED TO THE HIGH T$_{c}$ SUPERCONDUCTORS

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[Ri, Eui-Jae;]

Korean Academy of Industrial Technologies;

한국표면공학회지, Vol. 29, No. 5, pp. 415-423.

DOI :

SHAPE MEMORY THIN FILM OF TITANIUM-NICKEL FOR MICROACTUATOR FORMED BY SPUTTERING

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[Takei, A.;Ishida, A.;]

National Research Institute for Metals;

한국표면공학회지, Vol. 29, No. 5, pp. 424-429.

DOI :

HIGH TEMPERATURE SUPERCONDUCTING THIN FILMS PREP ARED BY PULSED LASER DEPOSITION

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[Park, Yong-Ki;Kim, In-Seon;Ha, Dong-Han;Hwang, Doo-Sup;Huh, Yun-Sung;Park, Jong-Chul;]

Korea Research Institute of Standards and Science;Samsung Electronics Co. Ltd, Semiconductor R & D Center;Samsung Electronics Co. Ltd.;

한국표면공학회지, Vol. 29, No. 5, pp. 430-436.

DOI :

FABRICATION OF HIGH QUALITY YBa$_2$Cu$_3$O$_{y}$ THIN FILMS USING PULSED LASER DEPOSITION

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[Lee, Eun-Hong;Park, Sang-Jin;Song, I-Hun;Song, In-Sang;Gohng, Jun-Ho;Sok, Jung-Hyun;Lee, Jo-Won;]

Electronic Materials Lab., Materials Sector, Samsung Advanced Institute of Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 437-442.

DOI :

PLASMA-SULFNITRIDING USING HOLLOW CATHODE DISCHARGE

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[Urao, Ryoichi;Hong, Sung-pill;]

Materials Science, School of Engineering, Ibaraki University;Graduate School, Ibaraki University;

한국표면공학회지, Vol. 29, No. 5, pp. 443-448.

DOI :

INFLUENCE OF ANTHRECENE DOPING ON ELECTRICAL AND LIGHT-EMITTING BEHAYIOR OF 8-HYDROXYQUINOLINE-ALUMINUM BESED ELECTROLUMINESCENT DEVICES

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[Kinoshita, Osamu;Yamaguchi, Ryuichi;Masui, Masayoshi;Takeuchi, Manabu;]

Department of Electrical and Electronic Engineering, Ibaraki University;

한국표면공학회지, Vol. 29, No. 5, pp. 449-453.

DOI :

THERMAL PROPERTIES OF SIC/C FUNCTIONALLY GRADIENT MATERIALS BY CVD

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[Kim, Yoo-Taek;Auh, Keun-Ho;]

Department of Materials Science and Engineering, Kyonggi University;Depatment of Ceramic Engineering, Hanyang University;

한국표면공학회지, Vol. 29, No. 5, pp. 454-458.

DOI :

THIN FILM SENSORS FOR AUTOMOBILE

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[Taga, Yasunori;]

TOYOTA Central Research and Development Laboratories.;

한국표면공학회지, Vol. 29, No. 5, pp. 459-466.

DOI :

USE OF SINGLE PRECURORS FOR THE PREP ARATION OF SILICON CARBIDE FILMS

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[Lee, Kyunf-Won;Yu, Kyu-Sang;Kim, Yun-Soo;]

Korea Research Institute of Chemical. Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 467-473.

DOI :

SOLID STATE CESIUM ION BEAM SPUTTER DEPOSITION

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[Baik, Bong-Koo;Choi, Dong-Jun;Han, Dong-Won;Kim, Yong-Hwan;Kim, Seong-In;]

Department of Metallurgical Engineering, Yonsei University;SKION Corporation;

한국표면공학회지, Vol. 29, No. 5, pp. 474-477.

DOI :

APPLICATION OF DISPROPORTIONATION REACTION TO SURFACE TREATMENT

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[Oki, Takeo;]

Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 478-481.

DOI :

APPLICATIONS OF SOI DEVICE TECHNOLOGY

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[Ryoo, Kunkul;]

Materials Surface Research Team;

한국표면공학회지, Vol. 29, No. 5, pp. 482-486.

DOI :

LOW TEMPERATURE DIAMOND GROWTH USING MICROWAVE PLASMA CVD

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[Sakamoto, Yukihiro;Takaya, Matsufumi;Shinohara, Kibatsu;]

Chiba Institute of Technology;Nihon Koshuha, CO., Ltd;

한국표면공학회지, Vol. 29, No. 5, pp. 487-493.

DOI :

EFFECTS OF NITROGEN AND CARBON ION IMPLANTATION INTO AUSTENITIC STAINLESS STEEL ON HYDROGEN ABSORPTION

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[Terashima, K.;Minegishi, T.;Matsusaka, K.;]

Chiba Inst. of Tech.;Shibaura Inst. of Tech.;

한국표면공학회지, Vol. 29, No. 5, pp. 494-497.

DOI :

SPUTTER-DEPOSITION OF CARBON NITRIDE FILMS WITH HIGH NITROGEN CONCENTRATION

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[Taki, Yusuke;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 498-504.

DOI :

FIELD EMISSION CHARACTERISTICS OF DIAMOND FILMS

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[Park, Kyung-Ho;Lee, Soon-Il;Koh, Ken-Ha;Park, Jung-Il;Park, Kwang-Ja;]

Department of Physics, Ajou University;Inorganic Chemistry Department, National Institute of Technology and Quality;

한국표면공학회지, Vol. 29, No. 5, pp. 505-511.

DOI :

STRUCTURE AND MACHANICAL PROPERTIES OF a-C:N MULTILAYER FILMS PREPARED BY ARC ION PLATING

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[Kitagawa, Toshihisa;Taki, Yusuke;Takai, Osamu;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 512-518.

DOI :

XPS STUDY ON SN-DOPED DLC FILMS PREPARED BY RF PLASMA-ENHANCED CVD

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[Inoue, Y.;Komoguchi, T.;Nakata, H.;Takai, O.;]

Department of Materials Processing Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 519-524.

DOI :

CRYSTALLINE PHASES AND HARDNESS OF (Ti$_{1-x}$Al$_{x}$)N COATINGS DEPOSITED BY REACTIVE SPUTTERING

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[Park, Chong-Kwan;Park, Joo-Dong;Oh, Tae-Sung;]

Department of Metallurgy and Materials Science, Hong Ik University;

한국표면공학회지, Vol. 29, No. 5, pp. 525-531.

DOI :

SPECTRO-ELLIPSOMETRIC STUDIES OF STRUCTURE AND OPTICAL PROPERTIES OF PLSMA-GROWN DLC FILMS

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[Rhee, Sung-Gyu;Lee, Soon-Il;Oh, Soo-Ghee;Lee, Kwang-Ryeol;]

Department of physics Ajou University;Division of Ceramics, Korea Institute of Science and Technnology;

한국표면공학회지, Vol. 29, No. 5, pp. 532-539.

DOI :

ADHESION STRENGTH OF DIAMOND COATED WC-Co TOOLS USING MICROWAVE PLASMA CVD

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[Kiyama, Nobumichi;Sakamoto, Yukihiro;Takaya, Matsufumi;]

Chiba Institute of Technology, Graduate School;Chiba Institute of Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 540-544.

DOI :

A STUDY ON WEAR AND CORROSION RESISTANCE OF CrN$_{x}$ FILMS BY CATHODIC ARC ION PLATING PROCESS

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[Han, Jeon-G.;Kim, Hyung-J.;Kim, Sang-S.;]

Plasm Applied Materials Lab., Department of Metallurgical Engineering, Sung Kyun Kwan University;

한국표면공학회지, Vol. 29, No. 5, pp. 545-548.

DOI :

NITROGEN DOPED DIAMOND LIKE CARBON FILM SYNTHESIZED BY MICROWAVE PLASMA CVD

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[Urao, Ryoichi;Hayatsu, Osamu;Satoh, Toshihiro;Yokota, Hitoshi;]

Materials Science, School of Engineering, Ibaraki University;Graduate School, Ibaraki University;

한국표면공학회지, Vol. 29, No. 5, pp. 549-555.

DOI :

OPTICAL PROPERTIES OF AMORPHOUS CN FILMS

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[Park, Sung-Jin;Lee, Soon-Il;Oh, Soo-Ghee;Bae, J.H.;Kim, W.M.;Cheong, B.;Kim, S.G.;]

Department of Physics, Ajou University;Division of Metals, Korea Institute of Science and Technology;

한국표면공학회지, Vol. 29, No. 5, pp. 556-562.

DOI :

DEGRADATION OF Zn$_3$$N_2$ FILMS PREPARED BY REACTIVE RF MAGNETRON SPUTTERING

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[Futsuhara, Masanobu;Yoshioka, Katsuaki;Takai, Osamu;]

Department of Materials Processing Engineering, School of Engineering, Nagoya University, Paint Design Institute, Nippon Paint Co., Ltd.;Paint Design Institute, Nippon Paint Co., Ltd.;Department of Materials Processing Engineering, School of Engineering, Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 563-569.

DOI :

PROPERTIES OF PIB-CU FILMS ACCELERATION VOLTAGE AND IONIZATION POTENTIAL

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[Kim, K.H.;Jang, H.G.;Han, S.;Choi, S.C.;Choi, D.J.;Jung, H.J.;Koh, S.K.;]

Div. of Ceramics, Korea Institute of Science and Technology;Dept. of Ceramic engineering, Yonsei university;

한국표면공학회지, Vol. 29, No. 5, pp. 570-576.

DOI :

EFFECTS OF SUBSTRATE TEMPERATURE ON PROPERTIES OF FLUORINE CONTAINED SILICON OXIDE FILMS PREPARED BY MICROWAVE PLASMA- ENHANCED CVD

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[Sugimoto, Nobuhisa;Hozumi, Atsushi;Takai, Osamu;]

Department of Materials Processing Engineering Nagoya University;

한국표면공학회지, Vol. 29, No. 5, pp. 577-584.

DOI :

EFFECTS OF GAS PRESSURES ON GRANULAR STRUCTURE`S FOR MATION OF ALUMINUM FILMS PREPARED BY PVD PROCESS

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[Lee, Myeong-hoon;]

Korea Maritime University;

한국표면공학회지, Vol. 29, No. 5, pp. 585-592.

DOI :

DECOMPOSITION OF HIGHER ORGANIC COMPOUND IN AN ATMOSPHERIC PRESSURE NON-EQUILIBRIUM PLASMA

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[Kitokawa, Kazutoshi;Itou, Akihito;Sugiyama, Kazuo;]

Department of Applied Chemistry, Faculty of Engineering. Saitama University;

한국표면공학회지, Vol. 29, No. 5, pp. 593-598.

DOI :